PLASMA ETCHERS AND PLASMA DEPOSITION SYSTEMS

SENTECH Instruments GmbH develops, manufactures and sells advanced quality Plasma Process Technology (plasma etcher, plasma deposition systems).

Plasma process technology equipment is used for high precision etching and layer deposition in semiconductors and micro systems applications. SENTECH Instruments offers its products and services worldwide. KKI International Pty Ltd is the official representative of SENTECH Instruments GmbH in Australia and New Zealand.

ICP PLASMA ETCHERS

SI 500 – PTSA ICP plasma etcher for low damage, high aspect ratio, high rate etching of semiconductors and dielectrics. Read more

SI 500 C – cryogenic PTSA ICP plasma etcher for DRIE with unsurpassed small sidewall roughness. Read more

RIE PLASMA ETCHERS

Etchlab 200 – upgradeable low cost RIE plasma etcher. Read more

SI 591 – advanced RIE plasma etcher for chlorine and fluorine chemistry. Read more

SI 100 - open lid RIE plasma etcher for large area samples and large number of wafers, respectively. Read more

PECVD DEPOSITION SYSTEMS

SI 500 D – ICPECVD system for high plasmadensity deposition of dielectric films with unsurpassed mechanical, electrical and chemical poperties at low temperatures (80°C-130°C). Read more

SI 500 PPD – PECVD plasma deposition system for dielectric films with stress control. Read more